Mea Hoʻolako ʻOihana/Electronic Grade TMAH 25% Tetramethylammonium Hydroxide Kiʻi Hōʻike ʻia

Mea Hoʻolako Hana Hana/Electronic Grade TMAH 25% Tetramethylammonium Hydroxide

ʻO ka wehewehe pōkole:

inoa huahana: Tetramethylammonium hydroxide

NO KA CAS: 75-59-2

Ke ʻano: wai aniani ʻole kala

ʻIke: 25.0%,

Hoʻopili: 200kgs / pahu

ʻO Tetramethylammonium hydroxide (TMAH a i ʻole TMAOH) he paʻakai ammonium quaternary me ke ʻano molekole [(CH3)4N]+[OH]-, a ʻo ia ka lālā maʻalahi o ka papa o nā pūhui ammonium quaternary organik.ʻO kekahi o kāna hoʻohana ʻoihana no ka etching anisotropic o ke silika.Hoʻohana ʻia ʻo ia ma ke ʻano he mea hoʻoheheʻe kumu i ka hoʻomohala ʻana o ka photoresist acidic i ke kaʻina photolithography.No ka mea he mea hoʻololi hoʻololi ia, ʻoi aku ka maikaʻi o ka wehe ʻana i ka photoresist.Hoʻohana ʻia ʻo ia ma ke ʻano he surfactant i ka synthesis o ferrofluid, e pale i ka agglomeration.

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Huahana Huahana

wehewehe

Tetramethylammonium hydroxide(TMAH a i ʻole TMAOH) he paʻakai ammonium quaternary me ke ʻano molekala [(CH₃)₄N]⁺[OH]^-, a ʻo ia ka lālā maʻalahi o ka papa o nā pūhui ammonium quaternary organik.ʻO kekahi o kāna hoʻohana ʻoihana no ka etching anisotropic o ke silika.Hoʻohana ʻia ʻo ia ma ke ʻano he mea hoʻoheheʻe kumu i ka hoʻomohala ʻana o ka photoresist acidic i ke kaʻina photolithography.No ka mea he mea hoʻololi hoʻololi ia, ʻoi aku ka maikaʻi o ka wehe ʻana i ka photoresist.Hoʻohana ʻia ʻo ia ma ke ʻano he surfactant i ka synthesis o ferrofluid, e pale i ka agglomeration.

Hōʻike:

inoa kemika	ʻO ka hopena Tetramethylammonium hydroxide
inoa ʻē aʻe	TMAH
CAS #	75-59-2
Maemae	25% min
ʻAno molekala	(CH3)4NOH
Kaumaha molekula	91.15
Na Waiwai Kemika	ʻAʻole waihoʻoluʻu i ka wai melemele māmā. Maʻalahi e komo i ke kalapona dioxide, alkaline ikaika, corrosive ikaika.
Palapala noi	1. Nā mea hoʻokalakupua hoʻoili ʻia i loko o ke kemika synthetic. 2. Anisotropic corrosion solution no ka 'oihana uila, catalyst for polymerization of silicone rubber and other silicone products
Hoʻopili	1KG, 25KG, 200kg, 1000KG IBC, ISO TANK

Pepa ʻikepili ʻenehana/TDS:

Nā kikoʻī	'ikamu	Unite	MIN	MAX
	Hoʻāʻo	%	24.90	25.10
	kalakala	Hazen		5
	CO₃^2-(Kapona)	ppm		100
	Cl^-( Kloride )	ppm		0.1
	CH₃OH (Methanol)	ppm		40
	Li (Lithium)	ppb		5
	Na (Sodium)	ppb		10
	Mg (Magnesium)	ppb		5
	Al (Aluminium)	ppb		10
	K (Potasuma)	ppb		10
	Ca (Kalekauma)	ppb		10
	Cr (Chromium)	ppb		5
	Mn (Manekene)	ppb		5
	Fe (Hao)	ppb		5
	Ni (Nikela)	ppb		5
	Co (Cobalt)	ppb		5
	Cu (Ke keleawe)	ppb		5
	Zn (Zink)	ppb		5
	Mo (Molybdenum)	ppb		5
	Cd (Cadmium)	ppb		5
	Pb (Lead)	ppb		5
	Ag (Kālā)	ppb		5
	ʻĀpana >=0.5um	Ea/ml		100

Na Waiwai Kino*	Puka	Waiwai
	Lae paila,°C	100.0
	Lae hau, °C	<-25.0
	Viscosity@ 25 °C,cst	2.8
	Kaumaha kiko @ 60 °F	1.022
	Puni Uila (Pensky Martens), °F	>200
	pH	>13

ʻIke hoʻouna	Nā pahu pahu
	200L pahu maʻemaʻe
	Loaʻa nā pahu ʻē aʻe ma ke noi.
	Hoʻokaʻawale moku
	Ka inoa hoʻouna kūpono: tetramethylammonium hydroxide
	Hoʻohui pōʻino: 8
	Helu ʻike: UN1835, PGII

Ka palekana a me ka lawelawe ʻana	No ka 'ike palekana a me ka lawelawe 'ana, e nānā i ka
	Pepa ʻIkepili Palekana Mea i loaʻa ma ke noi.

ʻŌlelo *

ʻO ka Tetramethylammonium Hydroxide (2.380%, 20.0%, electronic grade), TMAH (25%, 98%, Industrial grade), e ʻoluʻolu e kelepona mai iā mākou no nā kikoʻī.

Palapala noi

1) Ma ke ʻano o ka nānā ʻana, hiki ke hoʻohana ʻia ka tetramethylammonium Hydroxide ma ke ʻano he polarographic reagent.

2) Ma ke ʻano o ka hoʻomaʻemaʻe ʻana i ka huahana, ua hoʻohana ʻia ʻo ia e like me ka alkali lehu ʻole e hoʻomoe i kekahi mea metala.

3) i loko o ka ʻoihana uila, ʻoi aku ka maikaʻi e like me ka mea hoʻomohala kūpaʻa maikaʻi, silicon wafer wet etchant a me ka hopena maʻemaʻe loa no ke kaʻina CMP.

4) i ka hana ʻana i nā kaapuni i hoʻohui ʻia, nā hōʻike aniani wai, nā papa kaapuni i paʻi ʻia, nā capacitors, nā sensor, a me nā mea uila ʻē aʻe he nui.